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Pattern generators are considered to be complex tools in manufacturing of semiconductor devices. High requirements to such equipment can be met only with the help of high-end technology.

KBTEM-OMO has extensive experience in the development of opto-mechanical equipment. The model line of multichannel laser pattern generators for microelectronics built on the raster scan concept is characterized by exceptional functional features:
- direct writing on wafers (maskless optical lithography);
- overlay option;
- high throughput;
- process switch to mask writting mode.

The universality of such high-performance equipment makes it indispensable for scientific institutions and microelectronics manufacturers.

EM-5389 Multichannel laser pattern generator

EM-5289B Multichannel laser pattern generator

EM-5189-02 Multichannel laser pattern generator

Equipment for wafer projection imaging 曝光機

Equipment for wafer projection imaging is of crucial importance for the mass production in order to decrease cost price of products, therefore the most important parameter of this class of equipment is high efficiency and operational characteristics providing high percent yield. It is completely automated equipment with machine vision systems, high-end software, reprogrammable loading devices.

EМ-5084B Wafer Stepper

Tools for proximity exposure and double-side lithography 雙面光刻系統(tǒng)

EM-5026xx series and EM-5096 tools are intended for pattern alignment on photomasks and wafers (substrates) and further transfer of this pattern from mask to wafer through contact (proximity) exposure of wafer photoresistive layer.

Main features:
- wedge compensation and wafer thickness compensation without contact with the photomask;
- 3 coordinates (X, Y, Q) high precision wafer manipulator with coarse and fine alignment modes;
- ability to handle 0.2 mm to 0.8 mm wafers made of fragile materials (GaAs, LiNbO3) and rectangular substrates;
- built-in vibration protection unit;
- energy saving mode.

EM-5026AM Mask aligner

EM-5096 Mask aligner

EM-5026M1 Mask aligner

EM-5026B Double-side mask aligner

EM-5186 Double-side alignment mark placement system

Wafer inspection equipment 晶片檢測系統(tǒng)

The equipment enabling inspection processes is characterized by a large diversity and essentially differs in the degree of complexity: from simple visual inspection tools for mass production to the most complex automatic inspection and measurement systems which are used both in the R& D of new technologies and devices, as well as in the large-scale production.

EМ-6419 Wafer flatness inspection system

EМ-6429 Automatic patterned wafer micro defect inspection system

EМ-6529 Automatic patterned wafer macro defect inspection system

EМ-6479 Automatic unpatterned wafer defect inspection system

EМ-6015M Automated wafer inspection system

EМ-6239 Automated micro size inspection system

Large-area steppers

The large-area stepper family is developed by KBTEM-OMO for the flip-chip assembly of high-end chips with numerous output contacts. The flip-chip packaging in many respects determines functional performance of a chip and meets evergrowing demand for higher electrical parameters, further miniaturization, higher reliability, heat and power control at stable cost decrease.

EМ-5434 Automatic High Density Integration PCB Stepper
EM-5534 Bumping Stepper
EM-5634 CCD Stepper

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晶片刻蝕和檢測系統(tǒng)